Plasmatexturierung von Silizium als Alternative zur nasschemischen Texturierung und prozessintegrativer Einfluss auf die Passivierungsbeschichtung
- J. Hirsch, M. Gaudig, M. Gläser, S. Großer, N. Bernhard, D. Lausch: Optimized SiN surface passivation of maskless Inductively Coupled Plasma (ICP) formed Black-Silicon without additional Self-Bias, Proc. 31st EUPVSEC (2015)
- 14th International Conference on Plasma Surface Engineering:
“Front- and Rearside Plasma Texturing of Crystalline Silicon Wafers for PV Applications”, Garmisch-Partenkirchen, 2014 - J. Hirsch, D.Lausch, N.Bernhard
- EU PVSEC 2014:
“Investigation of the Optoelectronic Properties of Crystalline Silicon Textured by Maskless Plasma Etching at Different Ignition Modes” - Maria Gaudig, Jens Hirsch, Johannes Ziegler, Thomas Schneider, Martina Werner, Alexander Sprafke, Norbert Bernhard, Ralf. B. Wehrspon
- PV Days:
“Inductive Coupled Plasma (ICP) Textures as Alternative for Wet Chemical Etching in Solar Cell Fabrication”, Halle (Saale), 21.-22.10.2014 - J. Hirsch